We Make NanoTechnology Work!® |
High Rate Polishing Slurry for
Precision Optics
Nanophase CE-6950
We Make NanoTechnology Work!® |
CE-6950 High Rate Slurry Technology
• Best in class removal rates achieved through novel
c...
We Make NanoTechnology Work!® |
CE-6950 Removal Rate versus Large Particles
3
9,055
8,305
7,977
7,400 7,600 7,800 8,000 8,...
We Make NanoTechnology Work!® |
CE-6950 Longevity on Fused Silica
4
5,000
5,500
6,000
6,500
7,000
7,500
8,000
8,500
9,000
...
We Make NanoTechnology Work!® |
Surface Finish Results for CE-6950
5
• Consistently achieve
good surface finish –
exceedin...
We Make NanoTechnology Work!® |
CE-6950 Particle Size Distribution
0
2
4
6
0.0 0.1 1.0 10.0 100.0
Frequency(%)
Particle Si...
We Make NanoTechnology Work!® |We Make NanoTechnology Work!® |
Request Your Sample
7
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of 7

Nanophase CE-6950 - High Rate Polishing Slurry for Precision Optics

One of the critical challenges of high volume precision optics is to achieve consistency in production without sacrificing the number of parts that can be produced per hour. Our new, high-rate cerium oxide slurry, Nanophase CE-6950, represents a new approach to meet this challenge. Request a sample: nanophase.com/high-rate-slurry-sample
Published on: Mar 3, 2016
Published in: Technology      
Source: www.slideshare.net


Transcripts - Nanophase CE-6950 - High Rate Polishing Slurry for Precision Optics

  • 1. We Make NanoTechnology Work!® | High Rate Polishing Slurry for Precision Optics Nanophase CE-6950
  • 2. We Make NanoTechnology Work!® | CE-6950 High Rate Slurry Technology • Best in class removal rates achieved through novel composition • Consistency in achieving desired specifications during initial processing without sacrificing the number of parts that can be produced per hour • Broad pH stability and tunability for polishing a wide range of glass types • Requires less topping off while maintaining high removal rates resulting in lowering your slurry waste and production costs 2
  • 3. We Make NanoTechnology Work!® | CE-6950 Removal Rate versus Large Particles 3 9,055 8,305 7,977 7,400 7,600 7,800 8,000 8,200 8,400 8,600 8,800 9,000 9,200 CE-6950 Cerox 1663 Unicer 166 Average MRR (Å/min) Fused Silica, 5.625 wt%, 55 RPM, 225 mL/min Flow Rate, using a PR-1 and Non-Embossed Suba X Pad CE-6950 was developed to consistently outperform the material removal rates of the most commonly used large ceria powders, enabling greater productivity
  • 4. We Make NanoTechnology Work!® | CE-6950 Longevity on Fused Silica 4 5,000 5,500 6,000 6,500 7,000 7,500 8,000 8,500 9,000 9,500 10,000 2 4 6 7 AverageMRR(Å/min) Hours of Polishing without Topping Off Fused Silica, 5.625 wt%, 55 RPM, 225 mL/min Flow Rate, using a PR-1 and Non-Embossed Suba X Pad CE-6950 maintains superior removal rate without top off to keep production going
  • 5. We Make NanoTechnology Work!® | Surface Finish Results for CE-6950 5 • Consistently achieve good surface finish – exceeding requirements of most precision applications • Ra = 0.90 nm • RMS = 1.1 nm • PV= 5.0 nm
  • 6. We Make NanoTechnology Work!® | CE-6950 Particle Size Distribution 0 2 4 6 0.0 0.1 1.0 10.0 100.0 Frequency(%) Particle Size (Microns) Particle Size Distribution of NanoArc CE-6950 Cerium Oxide Slurry in Water Using Horiba LA-910 Laser Light Scattering (RRI 1.50 - 0.10i) Volume Dist. Base 6 Mean PSD= 2.089 µm Broad particle size to achieve combination of high removal rate with excellent surface quality
  • 7. We Make NanoTechnology Work!® |We Make NanoTechnology Work!® | Request Your Sample 7 nanophase.com/high-rate-slurry-sample

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